Surface Modification of Electroosmotic Silicon Microchannel Using Thermal Dry Oxidation

A simple fabrication method for the surface modification of an electroosmotic silicon microchannel using thermal dry oxidation is presented. The surface modification is done by coating the silicon surface with a silicon dioxide (SiO2) layer using a thermal oxidation process. The process aims not onl...

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Autori principali:	Tuan Norjihan Tuan Yaakub, Jumril Yunas, Rhonira Latif, Azrul Azlan Hamzah, Mohd Farhanulhakim Mohd Razip Wee, Burhanuddin Yeop Majlis
Natura:	Artigo
Lingua:	Inglês
Pubblicazione:	MDPI AG 2018-05-01
Serie:	Micromachines
Soggetti:	surface modification electroosmotic flow microfluidic silicon nanochannel thermal oxidation
Accesso online:	http://www.mdpi.com/2072-666X/9/5/222
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