Wafer-Scale ALD Synthesis of MoO₃ Sulfurized to MoS₂

Silicon has dimensional limitations in following Moore’s law; thus, new 2D materials complementing Silicon are being researched. Molybdenum disulfide (MoS₂) is a prospective material anticipated to bridge the gap to complement Silicon and enhance the performances of semiconductor devices...

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Principais autores:	Sachin Shendokar, Moha Feroz Hossen, Shyam Aravamudhan
Formato:	Artigo
Idioma:	Inglês
Publicado:	MDPI AG 2024-07-01
Series:	Crystals
Assuntos:	silicon limitations 2D materials Molybdenum disulfide (MoS<sub>2</sub>) Molybdenum trioxide (MoO<sub>3</sub>) atomic layer deposition (ALD) chemical vapor deposition (CVD)
Acceso en liña:	https://www.mdpi.com/2073-4352/14/8/673
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