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A Novel Silicon on Diamond Structure to Improve Drain Induced Barrier Lowering

A silicon on diamond structure to improve DIBL is presented. The electrical field penetration through the buried insulator of diamond degrades the DIBL. In the new structure, a second, double insulating material, e.g. SiO2 is added on top of the buried insulator and partially covers the diamond. The...

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Principais autores: Arash Daghighi, Jafar Hoseini-Teshnizi, GholamReza Amini
Formato: Artigo
Idioma:Inglês
Publicado: OICC Press 2024-02-01
Series:Majlesi Journal of Electrical Engineering
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Acceso en liña:https://oiccpress.com/mjee/article/view/5234
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