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Intense Red Catho- and Photoluminescence from 200 nm Thick Samarium Doped Amorphous AlN Thin Films

<p>Abstract</p> <p>Samarium (Sm) doped aluminum nitride (AlN) thin films are deposited on silicon (100) substrates at 77 K by rf magnetron sputtering method. Thick films of 200 nm are grown at 100&#8211;200 watts RF power and 5&#8211;8 m Torr nitrogen, using a metal target of Al with Sm. X-ray diffr...

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Principais autores: Ali Tariq, Maqbool Muhammad
Format: Artigo
Sprog:Inglês
Udgivet: SpringerOpen 2009-01-01
Serier:Nanoscale Research Letters
Fag:
Cathodoluminescence
Photoluminescence
Thermal activation
XRD
Samarium
AlN
Online adgang:http://dx.doi.org/10.1007/s11671-009-9309-7
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