Compensation of systematic errors in thin-film elements using photomask elements
Several methods are considered for compensating for systematic errors in the design parameters of thin-film resistors that determine the yield of functional microassemblies. A method of compensation is proposed by modifying the dimensions of photomask elements according to specific algorithms, which...
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| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Politekhperiodika
2004-08-01
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| Serie: | Технологія та конструювання в електронній апаратурі |
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| Accesso online: | https://tkea.com.ua/index.php/journal/article/view/1135 |
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