Characterization of nanostructured SnO2 films deposited by reactive DC-magnetron sputtering
Nanostructured tin oxide thin films were deposited on silicon and glass slides substrates by reactive DC-Magnetron sputtering using a tin target in a mixture of argon and oxygen gases. The substrate temperature was varied in the range from 53 to 243 oC, keeping the other deposition parameters consta...
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| Vydáno v: | Superficies y vacío |
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| Hlavní autoři: | , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
2013
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| Témata: | |
| On-line přístup: | https://www.redalyc.org/articulo.oa?id=94229715005 |
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