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Effects of the methane content on the characteristics of diamond like carbon films produced by sputtering

In this work, hydrogenated carbon films were sputter deposited at low temperatures using different Ar-CH4 mixtures. The deposition rate of the films increases with up to a factor of 6 when comparing a CH4 rich mixture to a pure Ar plasma. At the same time, the sp3 carbon content is much higher when...

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Publicat a:Superficies y vacío
Autors principals: R.D. Mansano, P. Verdonck, P.M. Nogueira, L.S. Zambom, H.S. Maciel, C. Otani, M. Massi
Format: Artigo
Idioma:Inglês
Publicat: Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C. 1999
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Accés en línia:https://www.redalyc.org/articulo.oa?id=94200929
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