Influence of process parameters on the growth of pure-phase anatase and rutile TiO2 thin films deposited by low temperature reactive magnetron sputtering

In this work is investigated the optimal conditions for deposition of pure- phase anatase and rutile thin films prepared at low temperatures (less than 150ºC) by reactive dc magnetron sputtering onto well- cleaned p- type Si substrates. For this, the variation of deposition plasma parameters as subs...

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Detalles Bibliográficos
Publicado en:Brazilian Journal of Physics
Main Authors: H. Toku, R.S. Pessoa, H.S. Maciel, M. Massi, U.A. Mengui
Formato: Artigo
Idioma:Inglês
Publicado: Sociedade Brasileira de Física 2010
Assuntos:
Física, Astronomía y Matemáticas
ray diffraction
titanium dioxide
magnetron sputtering
Atomic force microscopy
Acceso en liña:https://www.redalyc.org/articulo.oa?id=46415798015
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