Chargement en cours...
Formation of electrical conductive hard-carbon (DLC) films using i C4H10/N2 supermagnetron plasma
Electrical conductive hard-carbon (DLC) films were formed by using a supennagnetron plasma CVD method. Using mixed gas ofisobutane (i-C4H10) and N, DLC films were deposited on thermally oxidized Si wafers, and film deposition rate, hardness and resistivity were measured. Two rf powers of the same fr...
Enregistré dans:
| Publié dans: | Superficies y vacío |
|---|---|
| Auteurs principaux: | , , |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
|
| Sujets: | |
| Accès en ligne: | https://www.redalyc.org/articulo.oa?id=94200928 |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|