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Formation of electrical conductive hard-carbon (DLC) films using i C4H10/N2 supermagnetron plasma
Electrical conductive hard-carbon (DLC) films were formed by using a supennagnetron plasma CVD method. Using mixed gas ofisobutane (i-C4H10) and N, DLC films were deposited on thermally oxidized Si wafers, and film deposition rate, hardness and resistivity were measured. Two rf powers of the same fr...
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| Publicat a: | Superficies y vacío |
|---|---|
| Autors principals: | , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales A.C.
1999
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| Matèries: | |
| Accés en línia: | https://www.redalyc.org/articulo.oa?id=94200928 |
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