Numerical Simulation of HFCVD Process Used for Diamond Growth
Hot-filament chemical vapour deposition (HFCVD) is a common method employed for diamond deposition.Typically in this method a dilute mixture of carbon containing gas such as methane in hydrogen is thermallyactivated at sub atmospheric pressures by a hot filament. Due to the filament-substrate proxim...
Gardado en:
| Publicado en: | Brazilian Journal of Physics |
|---|---|
| Principais autores: | , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
Sociedade Brasileira de Física
2006
|
| Assuntos: | |
| Acceso en liña: | https://www.redalyc.org/articulo.oa?id=46436321 |
| Tags: |
Sen Etiquetas, Sexa o primeiro en etiquetar este rexistro!
|