Numerical Simulation of HFCVD Process Used for Diamond Growth
Hot-filament chemical vapour deposition (HFCVD) is a common method employed for diamond deposition.Typically in this method a dilute mixture of carbon containing gas such as methane in hydrogen is thermallyactivated at sub atmospheric pressures by a hot filament. Due to the filament-substrate proxim...
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| Publié dans: | Brazilian Journal of Physics |
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| Auteurs principaux: | , , |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
Sociedade Brasileira de Física
2006
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| Sujets: | |
| Accès en ligne: | https://www.redalyc.org/articulo.oa?id=46436321 |
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