Study of ion beam sputtering using a glow discharge ion source
In this work, sputtering yield in a glow discharge ion source system has been determined using the operating parameters of the ion source. The sputtering yield is found to be varied between 0.4 to 1 atoms removed per incident ion for nitrogen while for argon between 0.2 to 1.3 atoms removed per inci...
Shranjeno v:
| izdano v: | Brazilian Journal of Physics |
|---|---|
| Glavni avtor: | |
| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
Sociedade Brasileira de Física
2010
|
| Teme: | |
| Online dostop: | https://www.redalyc.org/articulo.oa?id=46413563005 |
| Oznake: |
Brez oznak, prvi označite!
|