Study of ion beam sputtering using a glow discharge ion source
In this work, sputtering yield in a glow discharge ion source system has been determined using the operating parameters of the ion source. The sputtering yield is found to be varied between 0.4 to 1 atoms removed per incident ion for nitrogen while for argon between 0.2 to 1.3 atoms removed per inci...
Gorde:
| Argitaratua izan da: | Brazilian Journal of Physics |
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| Egile nagusia: | |
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
Sociedade Brasileira de Física
2010
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| Gaiak: | |
| Sarrera elektronikoa: | https://www.redalyc.org/articulo.oa?id=46413563005 |
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