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Properties of CrSi(2) Layers Obtained by Rapid Heat Treatment of Cr Film on Silicon

The changes in the morphology and the electrophysical properties of the Cr/n-Si (111) structure depending on the rapid thermal treatment were considered in this study. The chromium films of about 30 nm thickness were deposited via magnetron sputtering. The rapid thermal treatment was performed by th...

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Bibliografske podrobnosti
izdano v:Nanomaterials (Basel)
Main Authors: Kuznetsova, Tatyana, Lapitskaya, Vasilina, Solovjov, Jaroslav, Chizhik, Sergei, Pilipenko, Vladimir, Aizikovich, Sergei
Format: Artigo
Jezik:Inglês
Izdano: MDPI 2021
Teme:
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC8308153/
https://ncbi.nlm.nih.gov/pubmed/34209379
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano11071734
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