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Metal-Assisted Catalytic Etching (MACE) for Nanofabrication of Semiconductor Powders
Electroless etching of semiconductors has been elevated to an advanced micromachining process by the addition of a structured metal catalyst. Patterning of the catalyst by lithographic techniques facilitated the patterning of crystalline and polycrystalline wafer substrates. Galvanic deposition of m...
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| Pubblicato in: | Micromachines (Basel) |
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| Autore principale: | |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
MDPI
2021
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8304928/ https://ncbi.nlm.nih.gov/pubmed/34209231 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12070776 |
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