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Deposition and Characterization of RP-ALD SiO(2) Thin Films with Different Oxygen Plasma Powers
In this study, silicon oxide (SiO(2)) films were deposited by remote plasma atomic layer deposition with Bis(diethylamino)silane (BDEAS) and an oxygen/argon mixture as the precursors. Oxygen plasma powers play a key role in the quality of SiO(2) films. Post-annealing was performed in the air at diff...
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| Udgivet i: | Nanomaterials (Basel) |
|---|---|
| Main Authors: | , , , , , , , |
| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
MDPI
2021
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| Fag: | |
| Online adgang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8145387/ https://ncbi.nlm.nih.gov/pubmed/33947065 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano11051173 |
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