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Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO(2) Thin Films via Atomic Layer Deposition
In this study, the effect of radical intensity on the deposition mechanism, optical, and electrical properties of tin oxide (SnO(2)) thin films is investigated. The SnO(2) thin films are prepared by plasma-enhanced atomic layer deposition with different plasma power from 1000 to 3000 W. The experime...
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| I publikationen: | Materials (Basel) |
|---|---|
| Huvudupphovsmän: | , , , , , |
| Materialtyp: | Artigo |
| Språk: | Inglês |
| Publicerad: |
MDPI
2021
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| Ämnen: | |
| Länkar: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7867222/ https://ncbi.nlm.nih.gov/pubmed/33540775 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma14030690 |
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