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Recent Advances in Sequential Infiltration Synthesis (SIS) of Block Copolymers (BCPs)
In the continuous downscaling of device features, the microelectronics industry is facing the intrinsic limits of conventional lithographic techniques. The development of new synthetic approaches for large-scale nanopatterned materials with enhanced performances is therefore required in the pursuit...
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| Pubblicato in: | Nanomaterials (Basel) |
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| Autori principali: | , , , , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
MDPI
2021
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC8069880/ https://ncbi.nlm.nih.gov/pubmed/33924480 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano11040994 |
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