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Recent Advances in Sequential Infiltration Synthesis (SIS) of Block Copolymers (BCPs)

In the continuous downscaling of device features, the microelectronics industry is facing the intrinsic limits of conventional lithographic techniques. The development of new synthetic approaches for large-scale nanopatterned materials with enhanced performances is therefore required in the pursuit...

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Detalhes bibliográficos
Publicado no:Nanomaterials (Basel)
Main Authors: Cara, Eleonora, Murataj, Irdi, Milano, Gianluca, De Leo, Natascia, Boarino, Luca, Ferrarese Lupi, Federico
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2021
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC8069880/
https://ncbi.nlm.nih.gov/pubmed/33924480
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano11040994
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