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4-Nitrobenzene Grafted in Porous Silicon: Application to Optical Lithography
In this work, we report a method to process porous silicon to improve its chemical resistance to alkaline solution attacks based on the functionalization of the pore surface by the electrochemical reduction of 4-nitrobenzendiazonium salt. This method provides porous silicon with strong resistance to...
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| Publicado no: | Nanoscale Res Lett |
|---|---|
| Main Authors: | , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer US
2016
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5042913/ https://ncbi.nlm.nih.gov/pubmed/27686091 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1654-8 |
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