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Interfacial Interactions during Demolding in Nanoimprint Lithography

Nanoimprint lithography (NIL) is a useful technique for the fabrication of nano/micro-structured materials. This article reviews NIL in the field of demolding processes and is divided into four parts. The first part introduces the NIL technologies for pattern replication with polymer resists (e.g.,...

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Publicat a:Micromachines (Basel)
Autors principals: Li, Mingjie, Chen, Yulong, Luo, Wenxin, Cheng, Xing
Format: Artigo
Idioma:Inglês
Publicat: MDPI 2021
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Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC8064091/
https://ncbi.nlm.nih.gov/pubmed/33805114
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12040349
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