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Branched High Aspect Ratio Nanostructures Fabricated by Focused Helium Ion Beam Induced Deposition of an Insulator
Helium ion beam induced deposition using the gaseous precursor pentamethylcyclopentasiloxane is employed to fabricate high aspect ratio insulator nanostructures (nanopillars and nanocylinders) that exhibit charge induced branching. The branched nanostructures are analyzed by transmission electron mi...
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| 發表在: | Micromachines (Basel) |
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| 主要作者: | |
| 格式: | Artigo |
| 語言: | Inglês |
| 出版: |
MDPI
2021
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| 主題: | |
| 在線閱讀: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7996577/ https://ncbi.nlm.nih.gov/pubmed/33668907 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi12030232 |
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