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Fabrication of carbon nanomembranes by helium ion beam lithography
The irradiation-induced cross-linking of aromatic self-assembled monolayers (SAMs) is a universal method for the fabrication of ultrathin carbon nanomembranes (CNMs). Here we demonstrate the cross-linking of aromatic SAMs due to exposure to helium ions. The distinction of cross-linked from non-cross...
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| Autori principali: | , , , |
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| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Beilstein-Institut
2014
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3943867/ https://ncbi.nlm.nih.gov/pubmed/24605285 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.5.20 |
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