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Fabrication of carbon nanomembranes by helium ion beam lithography
The irradiation-induced cross-linking of aromatic self-assembled monolayers (SAMs) is a universal method for the fabrication of ultrathin carbon nanomembranes (CNMs). Here we demonstrate the cross-linking of aromatic SAMs due to exposure to helium ions. The distinction of cross-linked from non-cross...
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| 主要な著者: | , , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Beilstein-Institut
2014
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3943867/ https://ncbi.nlm.nih.gov/pubmed/24605285 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.5.20 |
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