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Improved Current Density and Contact Resistance in Bilayer MoSe(2) Field Effect Transistors by AlO(x) Capping

[Image: see text] Atomically thin semiconductors are of interest for future electronics applications, and much attention has been given to monolayer (1L) sulfides, such as MoS(2), grown by chemical vapor deposition (CVD). However, reports on the electrical properties of CVD-grown selenides, and MoSe...

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Publicat a:ACS Appl Mater Interfaces
Autors principals: Somvanshi, Divya, Ber, Emanuel, Bailey, Connor S., Pop, Eric, Yalon, Eilam
Format: Artigo
Idioma:Inglês
Publicat: American Chemical Society 2020
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC7588022/
https://ncbi.nlm.nih.gov/pubmed/32678569
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsami.0c09541
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