Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting

Transition‐metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co‐P films were deposited by using PH(3) plasma as the phosphorus source and an extra H(2) plasma step to remove excess P in the growing films. The optimized ALD process proceeded b...

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Dettagli Bibliografici
Pubblicato in:Angew Chem Int Ed Engl
Autori principali: Zhang, Haojie, Hagen, Dirk J., Li, Xiaopeng, Graff, Andreas, Heyroth, Frank, Fuhrmann, Bodo, Kostanovskiy, Ilya, Schweizer, Stefan L., Caddeo, Francesco, Maijenburg, A. Wouter, Parkin, Stuart, Wehrspohn, Ralf B.
Natura: Artigo
Lingua:Inglês
Pubblicazione: John Wiley and Sons Inc. 2020
Soggetti:
Communications
Accesso online:https://ncbi.nlm.nih.gov/pmc/articles/PMC7540345/
https://ncbi.nlm.nih.gov/pubmed/32608102
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/anie.202002280
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