Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting

Transition‐metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co‐P films were deposited by using PH(3) plasma as the phosphorus source and an extra H(2) plasma step to remove excess P in the growing films. The optimized ALD process proceeded b...

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Bibliographic Details
Published in:Angew Chem Int Ed Engl
Main Authors: Zhang, Haojie, Hagen, Dirk J., Li, Xiaopeng, Graff, Andreas, Heyroth, Frank, Fuhrmann, Bodo, Kostanovskiy, Ilya, Schweizer, Stefan L., Caddeo, Francesco, Maijenburg, A. Wouter, Parkin, Stuart, Wehrspohn, Ralf B.
Format: Artigo
Language:Inglês
Published: John Wiley and Sons Inc. 2020
Subjects:
Communications
Online Access:https://ncbi.nlm.nih.gov/pmc/articles/PMC7540345/
https://ncbi.nlm.nih.gov/pubmed/32608102
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/anie.202002280
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