Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting

Transition‐metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co‐P films were deposited by using PH(3) plasma as the phosphorus source and an extra H(2) plasma step to remove excess P in the growing films. The optimized ALD process proceeded b...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Publicado no:Angew Chem Int Ed Engl
Main Authors: Zhang, Haojie, Hagen, Dirk J., Li, Xiaopeng, Graff, Andreas, Heyroth, Frank, Fuhrmann, Bodo, Kostanovskiy, Ilya, Schweizer, Stefan L., Caddeo, Francesco, Maijenburg, A. Wouter, Parkin, Stuart, Wehrspohn, Ralf B.
Formato: Artigo
Idioma:Inglês
Publicado em: John Wiley and Sons Inc. 2020
Assuntos:
Communications
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7540345/
https://ncbi.nlm.nih.gov/pubmed/32608102
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/anie.202002280
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!

Registos relacionados