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Effect of Annealing Temperature on Spatial Atomic Layer Deposited Titanium Oxide and Its Application in Perovskite Solar Cells

In this study, spatial atomic layer deposition (sALD) is employed to prepare titanium dioxide (TiO(2)) thin films by using titanium tetraisopropoxide and water as metal and water precursors, respectively. The post-annealing temperature is varied to investigate its effect on the properties of the TiO...

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Bibliografske podrobnosti
izdano v:Nanomaterials (Basel)
Main Authors: Hsu, Chia-Hsun, Chen, Ka-Te, Huang, Pao-Hsun, Wu, Wan-Yu, Zhang, Xiao-Ying, Wang, Chen, Liang, Lu-Sheng, Gao, Peng, Qiu, Yu, Lien, Shui-Yang, Su, Zhan-Bo, Chen, Zi-Rong, Zhu, Wen-Zhang
Format: Artigo
Jezik:Inglês
Izdano: MDPI 2020
Teme:
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC7408533/
https://ncbi.nlm.nih.gov/pubmed/32635629
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10071322
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