Effect of Annealing Temperature on Spatial Atomic Layer Deposited Titanium Oxide and Its Application in Perovskite Solar Cells

In this study, spatial atomic layer deposition (sALD) is employed to prepare titanium dioxide (TiO(2)) thin films by using titanium tetraisopropoxide and water as metal and water precursors, respectively. The post-annealing temperature is varied to investigate its effect on the properties of the TiO...

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Detalhes bibliográficos
Publicado no:Nanomaterials (Basel)
Main Authors: Hsu, Chia-Hsun, Chen, Ka-Te, Huang, Pao-Hsun, Wu, Wan-Yu, Zhang, Xiao-Ying, Wang, Chen, Liang, Lu-Sheng, Gao, Peng, Qiu, Yu, Lien, Shui-Yang, Su, Zhan-Bo, Chen, Zi-Rong, Zhu, Wen-Zhang
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2020
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Article
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7408533/
https://ncbi.nlm.nih.gov/pubmed/32635629
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10071322
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