Spectroscopic Properties of Si-nc in SiO(x) Films Using HFCVD

In the present work, non-stoichiometric silicon oxide films (SiO(x)) deposited using a hot filament chemical vapor deposition technique at short time and simple parameters of depositions are reported. This is motivated by the numerous potential applications of SiO(x) films in areas such as optoelect...

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Bibliografske podrobnosti
izdano v:Nanomaterials (Basel)
Main Authors: Hernández Simón, Zaira Jocelyn, Luna López, Jose Alberto, de la Luz, Alvaro David Hernández, Pérez García, Sergio Alfonso, Benítez Lara, Alfredo, García Salgado, Godofredo, Carrillo López, Jesus, Mendoza Conde, Gabriel Omar, Martínez Hernández, Hayde Patricia
Format: Artigo
Jezik:Inglês
Izdano: MDPI 2020
Teme:
Article
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC7407559/
https://ncbi.nlm.nih.gov/pubmed/32698419
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10071415
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