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Spatially controlled nano-structuring of silicon with femtosecond vortex pulses
Engineering material properties is key for development of smart materials and next generation nanodevices. This requires nanoscale spatial precision and control to fabricate structures/defects. Lithographic techniques are widely used for nanostructuring in which a geometric pattern on a mask is tran...
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| Publicado en: | Sci Rep |
|---|---|
| Main Authors: | , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
Nature Publishing Group UK
2020
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| Assuntos: | |
| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7387531/ https://ncbi.nlm.nih.gov/pubmed/32724048 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-020-69390-4 |
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