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Femtosecond pulsed laser deposition of silicon thin films

Optimisation of femtosecond pulsed laser deposition parameters for the fabrication of silicon thin films is discussed. Substrate temperature, gas pressure and gas type are used to better understand the deposition process and optimise it for the fabrication of high-quality thin films designed for opt...

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Bibliografiska uppgifter
Huvudupphovsmän: Murray, Matthew, Jose, Gin, Richards, Billy, Jha, Animesh
Materialtyp: Artigo
Språk:Inglês
Publicerad: Springer 2013
Ämnen:
Länkar:https://ncbi.nlm.nih.gov/pmc/articles/PMC3693986/
https://ncbi.nlm.nih.gov/pubmed/23758871
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-272
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