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Spatially controlled nano-structuring of silicon with femtosecond vortex pulses
Engineering material properties is key for development of smart materials and next generation nanodevices. This requires nanoscale spatial precision and control to fabricate structures/defects. Lithographic techniques are widely used for nanostructuring in which a geometric pattern on a mask is tran...
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| Publicado no: | Sci Rep |
|---|---|
| Main Authors: | , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group UK
2020
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7387531/ https://ncbi.nlm.nih.gov/pubmed/32724048 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-020-69390-4 |
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