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Atomic-Scale Patterning of Arsenic in Silicon by Scanning Tunneling Microscopy
[Image: see text] Over the past two decades, prototype devices for future classical and quantum computing technologies have been fabricated by using scanning tunneling microscopy and hydrogen resist lithography to position phosphorus atoms in silicon with atomic-scale precision. Despite these succes...
Gorde:
| Argitaratua izan da: | ACS Nano |
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| Egile Nagusiak: | , , , , , , , , , , |
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
American
Chemical Society
2020
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| Sarrera elektronikoa: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7146850/ https://ncbi.nlm.nih.gov/pubmed/32142256 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsnano.9b08943 |
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