A carregar...

Investigation of Recessed Gate AlGaN/GaN MIS-HEMTs with Double AlGaN Barrier Designs toward an Enhancement-Mode Characteristic

In this work, recessed gate AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs) with double AlGaN barrier designs are fabricated and investigated. Two different recessed depths are designed, leading to a 5 nm and a 3 nm remaining bottom AlGaN barrier under the gate...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Publicado no:Micromachines (Basel)
Main Authors: Wu, Tian-Li, Tang, Shun-Wei, Jiang, Hong-Jia
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2020
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7074664/
https://ncbi.nlm.nih.gov/pubmed/32028702
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi11020163
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!