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Homoepitaxy Growth of Single Crystal Diamond under 300 torr Pressure in the MPCVD System

The high-quality single crystal diamond (SCD) grown in the Microwave Plasma Chemical Vapor Deposition (MPCVD) system was studied. The CVD deposition reaction occurred in a 300 torr high pressure environment on a (100) plane High Pressure High Temperature (HPHT) diamond type II a substrate. The relat...

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Detalhes bibliográficos
Publicado no:Materials (Basel)
Main Authors: Wang, Xiwei, Duan, Peng, Cao, Zhenzhong, Liu, Changjiang, Wang, Dufu, Peng, Yan, Hu, Xiaobo
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2019
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6926801/
https://ncbi.nlm.nih.gov/pubmed/31795291
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma12233953
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