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High-electron-mobility (370 cm(2)/Vs) polycrystalline Ge on an insulator formed by As-doped solid-phase crystallization

High-electron-mobility polycrystalline Ge (poly-Ge) thin films are difficult to form because of their poor crystallinity, defect-induced acceptors and low solid solubility of n-type dopants. Here, we found that As doping into amorphous Ge significantly influenced the subsequent solid-phase crystalli...

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Detalhes bibliográficos
Publicado no:Sci Rep
Main Authors: Saito, M., Moto, K., Nishida, T., Suemasu, T., Toko, K.
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group UK 2019
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Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6851082/
https://ncbi.nlm.nih.gov/pubmed/31719607
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-019-53084-7
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