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Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering
Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce unique properties in ferromagnetic thin films. Earlier we h...
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| Publicado en: | Beilstein J Nanotechnol |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
Beilstein-Institut
2019
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| Assuntos: | |
| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6774078/ https://ncbi.nlm.nih.gov/pubmed/31598457 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.10.186 |
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