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Reproducible Performance Improvements to Monolayer MoS(2) Transistors through Exposed Material Forming Gas Annealing

Metal-mediated exfoliation has been demonstrated as a promising approach for obtaining large-area flakes of 2D materials to fabricate prototypical nanoelectronics. However, several processing challenges related to organic contamination at the interfaces of the 2D material and the gate oxide must be...

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Pubblicato in:ACS Appl Mater Interfaces
Autori principali: Guros, Nicholas B., Le, Son T., Zhang, Siyuan, Sperling, Brent A., Klauda, Jeffery B., Richter, Curt A., Balijepalli, Arvind
Natura: Artigo
Lingua:Inglês
Pubblicazione: 2019
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Accesso online:https://ncbi.nlm.nih.gov/pmc/articles/PMC6702458/
https://ncbi.nlm.nih.gov/pubmed/30990006
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsami.9b01486
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