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The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO(2) Thin Films and Their Insulator–Metal Transition Behavior
In this work, VO(2) thin films were deposited on Si wafers (onto (100) surface) by DC magnetron sputtering under different cathode bias voltages. The effects of substrate biasing on the structural and optical properties were investigated. The results show that the metal–insulator transition (MIT) te...
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| Publicat a: | Materials (Basel) |
|---|---|
| Autors principals: | , , , , , , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI
2019
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6650896/ https://ncbi.nlm.nih.gov/pubmed/31284405 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma12132160 |
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