Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO(2) Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160

Lignende værker

• The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO(2) Thin Films and Their Insulator–Metal Transition Behavior
  af: Zhang, Chunzi, et al.
  Udgivet: (2019)
• Growth of Silver Nanoparticles by DC Magnetron Sputtering
  af: P. Asanithi, et al.
  Udgivet: (2012-01-01)
• Characterization of ALN thin films deposited by DC reactive magnetron sputtering
  af: M. García-Méndez, et al.
  Udgivet: (2008)
• Influence of temperature on the electro-induced MIT of VO2 prepared by the magnetron sputtering method
  af: Sun, Xiaoning, et al.
  Udgivet: (2021)
• Effects of Annealing on TiN Thin Film Growth by DC Magnetron Sputtering
  af: Azadeh Jafari, et al.
  Udgivet: (2014-07-01)