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Nonlinear Etch Rate of Au-Assisted Chemical Etching of Silicon
[Image: see text] We demonstrated time-dependent mass transport mechanisms of Au-assisted chemical etching of Si substrates. Variations in the etch rate and surface topology were correlated with catalyst features and etching duration. Nonlinear etching characteristics were associated with the format...
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| Veröffentlicht in: | ACS Omega |
|---|---|
| Hauptverfasser: | , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
American Chemical Society
2017
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| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6641051/ https://ncbi.nlm.nih.gov/pubmed/31457564 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsomega.7b00232 |
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