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Nonlinear Etch Rate of Au-Assisted Chemical Etching of Silicon
[Image: see text] We demonstrated time-dependent mass transport mechanisms of Au-assisted chemical etching of Si substrates. Variations in the etch rate and surface topology were correlated with catalyst features and etching duration. Nonlinear etching characteristics were associated with the format...
Wedi'i Gadw mewn:
| Cyhoeddwyd yn: | ACS Omega |
|---|---|
| Prif Awduron: | , , , |
| Fformat: | Artigo |
| Iaith: | Inglês |
| Cyhoeddwyd: |
American Chemical Society
2017
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| Mynediad Ar-lein: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6641051/ https://ncbi.nlm.nih.gov/pubmed/31457564 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsomega.7b00232 |
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