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Nonlinear Etch Rate of Au-Assisted Chemical Etching of Silicon

[Image: see text] We demonstrated time-dependent mass transport mechanisms of Au-assisted chemical etching of Si substrates. Variations in the etch rate and surface topology were correlated with catalyst features and etching duration. Nonlinear etching characteristics were associated with the format...

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Detalhes bibliográficos
Publicado no:ACS Omega
Main Authors: Choi, Keorock, Song, Yunwon, Ki, Bugeun, Oh, Jungwoo
Formato: Artigo
Idioma:Inglês
Publicado em: American Chemical Society 2017
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6641051/
https://ncbi.nlm.nih.gov/pubmed/31457564
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsomega.7b00232
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