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Universal perpendicular orientation of block copolymer microdomains using a filtered plasma
Sub-10 nm patterns prepared by directed self-assembly (DSA) of block copolymer (BCP) thin films offer a breakthrough method to overcome the limitations of photolithography. Perpendicular orientation of the BCP nanostructures is essential for lithographic applications, but dissimilar surface/interfac...
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| 出版年: | Nat Commun |
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| 主要な著者: | , , , , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Nature Publishing Group UK
2019
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6606568/ https://ncbi.nlm.nih.gov/pubmed/31266942 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41467-019-10907-5 |
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