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Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute
The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation lithography for semiconductors and a variety of soft materials. It is imperative to simultaneously achieve many requirements such as a high resolution, orientation control of micro-domains, etch selectivity, rap...
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| Veröffentlicht in: | Sci Rep |
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| Hauptverfasser: | , , , , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Nature Publishing Group
2016
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4726028/ https://ncbi.nlm.nih.gov/pubmed/26782329 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep19481 |
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