Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute

The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation lithography for semiconductors and a variety of soft materials. It is imperative to simultaneously achieve many requirements such as a high resolution, orientation control of micro-domains, etch selectivity, rap...

Fuld beskrivelse

Na minha lista:
Bibliografiske detaljer
Udgivet i:Sci Rep
Main Authors: Seshimo, Takehiro, Maeda, Rina, Odashima, Rin, Takenaka, Yutaka, Kawana, Daisuke, Ohmori, Katsumi, Hayakawa, Teruaki
Format: Artigo
Sprog:Inglês
Udgivet: Nature Publishing Group 2016
Fag:
Article
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC4726028/
https://ncbi.nlm.nih.gov/pubmed/26782329
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep19481
Tags: Tilføj Tag
Ingen Tags, Vær først til at tagge denne postø!

Lignende værker