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Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography
Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an...
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| Publicado no: | Sensors (Basel) |
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| Main Authors: | , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2019
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6539013/ https://ncbi.nlm.nih.gov/pubmed/31083502 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/s19092182 |
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