טוען...
Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography
Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an...
שמור ב:
| הוצא לאור ב: | Sensors (Basel) |
|---|---|
| Main Authors: | , , |
| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
MDPI
2019
|
| נושאים: | |
| גישה מקוונת: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6539013/ https://ncbi.nlm.nih.gov/pubmed/31083502 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/s19092182 |
| תגים: |
הוספת תג
אין תגיות, היה/י הראשונ/ה לתייג את הרשומה!
|