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Tantalum Oxynitride Thin Films: Assessment of the Photocatalytic Efficiency and Antimicrobial Capacity
Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed proportion reactive gas mixture (85% N(2) + 15% O(2)). To produce the films, the partial pressure of the mixture in the working atmosphere was varied. The characteristics of the produced films were ana...
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| Publicado no: | Nanomaterials (Basel) |
|---|---|
| Main Authors: | , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2019
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6474096/ https://ncbi.nlm.nih.gov/pubmed/30909538 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano9030476 |
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