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Thermal transport across grain boundaries in polycrystalline silicene: A multiscale modeling

During the fabrication process of large scale silicene, through common chemical vapor deposition (CVD) technique, polycrystalline films are quite likely to be produced, and the existence of Kapitza thermal resistance along grain boundaries could result in substantial changes of their thermal propert...

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Shranjeno v:
Bibliografske podrobnosti
izdano v:Sci Rep
Main Authors: Khalkhali, Maryam, Rajabpour, Ali, Khoeini, Farhad
Format: Artigo
Jezik:Inglês
Izdano: Nature Publishing Group UK 2019
Teme:
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC6450874/
https://ncbi.nlm.nih.gov/pubmed/30952974
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-019-42187-w
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