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Thermal transport across grain boundaries in polycrystalline silicene: A multiscale modeling

During the fabrication process of large scale silicene, through common chemical vapor deposition (CVD) technique, polycrystalline films are quite likely to be produced, and the existence of Kapitza thermal resistance along grain boundaries could result in substantial changes of their thermal propert...

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Detalhes bibliográficos
Publicado no:Sci Rep
Main Authors: Khalkhali, Maryam, Rajabpour, Ali, Khoeini, Farhad
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group UK 2019
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6450874/
https://ncbi.nlm.nih.gov/pubmed/30952974
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-019-42187-w
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